DEVELOPMENT OF MICROSTRIP GAS CHAMBERS WITH MULTICHIP TECHNOLOGY

被引：25

作者：

NAGAE, T

TANIMORI, T

KOBAYASHI, T

MIYAGI, T

机构：

[1] TOKYO INST TECHNOL,DEPT PHYS,MEGURO KU,TOKYO 152,JAPAN

[2] RIKEN,WAKO,SAITAMA 35101,JAPAN

[3] TOSHIBA CO LTD,CTR RES & DEV,KAWASAKI 210,JAPAN

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT | 1992年 / 323卷 / 1-2期

关键词：

D O I：

10.1016/0168-9002(92)90295-F

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

We have developed the microstrip gas chamber (MSGC) by using multi-chip technology which supports high-density assembly of bare LSI chips on a silicon wafer. Our MSGC was operated steadily with approximately 10(3) gain more than one week. An energy resolution of 15% for 5.9 keV X-ray of a Fe-55 source was obtained. With a very thin polyimide substrate of 16 mum thickness, two interesting phenomena were observed; one was a strong dependence of gains on backplane potential, and the other was little time variation of gains. We also found that a guard mask of a thin polyimide layer on the cathode edge reduced incidental electrical discharges between anode and cathode strips.

引用

页码：236 / 239

页数：4

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