TRENCH ISOLATION TECHNOLOGY FOR MOS APPLICATIONS

被引：0
|
作者：
CHIANG, SY [1 ]
CHAM, KM [1 ]
WENOCUR, DW [1 ]
HUI, A [1 ]
RUNG, RD [1 ]
机构：
[1] HEWLETT PACKARD CO,PALO ALTO,CA 94304
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 08期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C327 / C327
页数：1
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