A NEW OXIDATION-RESISTANT SELF-ALIGNED TISI2 PROCESS

被引：0
|
作者：
TSENG, HH [1 ]
WU, CY [1 ]
机构：
[1] NATL CHIAO TUNG UNIV,COLL ENGN,INST ELECTR,HSINCHU,TAIWAN
来源：
IEEE ELECTRON DEVICE LETTERS | 1986年 / 7卷 / 11期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：623 / 624
页数：2
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