GROWTH AND CHARACTERIZATION OF HIGH-PURITY H2-IN-HCI-PH3 VAPOR-PHASE EPITAXY (VPE) INP

被引:0
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作者
ROTH, TJ
SKROMME, BJ
LOW, TS
STILLMAN, GE
ZINKIEWICZ, LM
机构
[1] UNIV ILLINOIS,MAT RES LAB,URBANA,IL 61801
[2] UNIV ILLINOIS,COORDINATED SCI LAB,URBANA,IL 61801
[3] TRW,TECHNOL RES CTR,EL SEGUNDO,CA 90245
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中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
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页码:36 / 44
页数:9
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