XPS AND AES STUDIES ON THE OXIDATION OF LAYERED SEMICONDUCTOR GASE

被引:114
|
作者
IWAKURO, H [1 ]
TATSUYAMA, C [1 ]
ICHIMURA, S [1 ]
机构
[1] TOYAMA UNIV,FAC ENGN,DEPT ELECTR,TAKAOKA,TOYAMA,JAPAN
关键词
D O I
10.1143/JJAP.21.94
中图分类号
O59 [应用物理学];
学科分类号
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页码:94 / 99
页数:6
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