AES AND XPS STUDY OF PLUTONIUM OXIDATION

被引：55
|
作者：
LARSON, DT
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1980年 / 17卷 / 01期
关键词：
D O I：
10.1116/1.570503
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：55 / 58
页数：4
相关论文
共 50 条
  • [1] AES, XPS AND EELS STUDY OF THE INITIAL OXIDATION OF POLYCRYSTALLINE CHROMIUM
    PALACIO, C
    MATHIEU, HJ
    LANDOLT, D
    [J]. SURFACE SCIENCE, 1987, 182 (1-2) : 41 - 55
  • [2] XPS-AES CHARACTERIZATION OF PLUTONIUM OXIDES AND OXIDE CARBIDE - THE EXISTENCE OF PLUTONIUM MONOXIDE
    LARSON, DT
    HASCHKE, JM
    [J]. INORGANIC CHEMISTRY, 1981, 20 (07) : 1945 - 1950
  • [3] APPLICATION OF FACTOR-ANALYSIS TO THE AES AND XPS STUDY OF THE OXIDATION OF CHROMIUM
    PALACIO, C
    MATHIEU, HJ
    [J]. SURFACE AND INTERFACE ANALYSIS, 1990, 16 (1-12) : 178 - 182
  • [4] THE OXIDATION OF ZINC IN AIR STUDIED BY XPS AND AES
    HAMMER, GE
    SHEMENSKI, RM
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02): : 1026 - 1028
  • [5] XPS STUDY OF PLUTONIUM OXIDES
    COURTEIX, D
    CHAYROUSE, J
    HEINTZ, L
    BAPTIST, R
    [J]. SOLID STATE COMMUNICATIONS, 1981, 39 (02) : 209 - 213
  • [6] XPS AND AES STUDIES ON THE OXIDATION OF LAYERED SEMICONDUCTOR GASE
    IWAKURO, H
    TATSUYAMA, C
    ICHIMURA, S
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1982, 21 (01): : 94 - 99
  • [7] OXIDATION BEHAVIOR OF NICKEL SILICIDES INVESTIGATED BY AES AND XPS
    VALERI, S
    DELPENNINO, U
    SASSAROLI, P
    [J]. SURFACE SCIENCE, 1983, 134 (03) : L537 - L542
  • [8] THE SUPERFICIAL OXIDATION OF INDIUM, SB AND INSB(111) - A LEED, AES, XPS AND UPS STUDY
    LEGARE, P
    HILAIRE, L
    MAIRE, G
    [J]. JOURNAL DE MICROSCOPIE ET DE SPECTROSCOPIE ELECTRONIQUES, 1980, 5 (06): : 771 - 782
  • [9] XPS and AES
    Asami, K
    [J]. DENKI KAGAKU, 1997, 65 (10): : 820 - 825
  • [10] Oxidation kinetics of Mg and Al surfaces studied by AES and XPS
    [J]. Surf Sci, 1-3 (192-198):
12345