VARIATIONS OF ELECTRON TRAPS IN BULK N-GAAS BY RAPID THERMAL-PROCESSING

被引：20
|
作者：
KATAYAMA, M [1 ]
USAMI, A [1 ]
WADA, T [1 ]
TOKUDA, Y [1 ]
机构：
[1] AICHI INST TECHNOL,DEPT ELECTR,YAKUSA,TOYOTA 47003,JAPAN
来源：
JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 02期
关键词：
D O I：
10.1063/1.339778
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：528 / 533
页数：6
相关论文
共 50 条
  • [1] EFFECTS OF RAPID THERMAL-PROCESSING ON ELECTRON TRAPS IN MOLECULAR-BEAM-EPITAXIAL GAAS
    KITAGAWA, A
    USAMI, A
    WADA, T
    TOKUDA, Y
    KANO, H
    [J]. JOURNAL OF APPLIED PHYSICS, 1989, 65 (02) : 606 - 611
  • [2] STUDY OF ELECTRON TRAPS IN N-GAAS RESULTING FROM INFRARED RAPID THERMAL ANNEALING
    KUZUHARA, M
    NOZAKI, T
    [J]. JOURNAL OF APPLIED PHYSICS, 1986, 59 (09) : 3131 - 3136
  • [3] ELECTRON AND HOLE TRAPS IN N-GAAS CRYSTALS
    OKUMURA, T
    TAKIKAWA, M
    IKOMA, T
    [J]. APPLIED PHYSICS, 1976, 11 (02): : 187 - 189
  • [4] TRANSIENT THERMAL-ANALYSIS FOR RAPID THERMAL-PROCESSING OF GAAS
    YANG, FK
    PIEN, SJ
    KWOR, R
    [J]. ADVANCES IN MATERIALS, PROCESSING AND DEVICES IN III-V COMPOUND SEMICONDUCTORS, 1989, 144 : 397 - 402
  • [5] EFFECTS OF RAPID THERMAL-PROCESSING ON MBE GAAS ON SI
    ITO, A
    KITAGAWA, A
    TOKUDA, Y
    USAMI, A
    KANO, H
    NOGE, H
    WADA, T
    [J]. RAPID THERMAL ANNEALING / CHEMICAL VAPOR DEPOSITION AND INTEGRATED PROCESSING, 1989, 146 : 413 - 418
  • [6] SPATIAL DISTRIBUTIONS OF INDUCED TRAPS IN SILICON BY RAPID THERMAL-PROCESSING
    TOKUDA, Y
    KOBAYASHI, N
    USAMI, A
    INOUE, Y
    IMURA, M
    [J]. JOURNAL OF CRYSTAL GROWTH, 1990, 103 (1-4) : 297 - 302
  • [7] INVESTIGATION OF THE UNIFORMITY OF OHMIC CONTACTS TO N-TYPE GAAS FORMED BY RAPID THERMAL-PROCESSING
    ZHOU, WY
    XU, J
    LIOU, YB
    HUANG, C
    [J]. SOLID-STATE ELECTRONICS, 1993, 36 (02) : 295 - 296
  • [8] INITIAL EVAPORATION RATES FROM GAAS DURING RAPID THERMAL-PROCESSING
    HAYNES, TE
    CHU, WK
    ASELAGE, TL
    PICRAUX, ST
    [J]. JOURNAL OF APPLIED PHYSICS, 1988, 63 (04) : 1168 - 1176
  • [9] RAPID THERMAL-PROCESSING OF FILMS
    CELLER, GK
    [J]. JOURNAL OF METALS, 1985, 37 (08): : A23 - A23
  • [10] DIRECT MEASUREMENT OF EVAPORATION DURING RAPID THERMAL-PROCESSING OF CAPPED GAAS
    HAYNES, TE
    CHU, WK
    PICRAUX, ST
    [J]. APPLIED PHYSICS LETTERS, 1987, 50 (16) : 1071 - 1073
12345