SECONDARY ION MASS-SPECTROMETRY PROFILING OF SHALLOW, IMPLANTED LAYERS USING QUADRUPOLE AND MAGNETIC-SECTOR INSTRUMENTS

被引:73
|
作者
VANDERVORST, W [1 ]
SHEPHERD, FR [1 ]
机构
[1] BELL NO RES,OTTAWA K1Y 4H7,ONTARIO,CANADA
关键词
D O I
10.1116/1.574152
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
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页码:313 / 320
页数:8
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