COMPARISON OF SIMS AND AES DEPTH PROFILE ANALYSES OF A NI/CR MULTILAYER SYSTEM

被引:0
|
作者
GNASER, H
RUDENAUER, FG
STEIGER, W
FLENTJE, G
HOFER, WO
LITTMARK, U
GIBER, J
MARTON, D
BRAUN, P
STORI, H
机构
[1] FORSCHUNGSZENTRUM JULICH, IGV, D-5170 JULICH 1, FED REP GER
[2] TECH UNIV BUDAPEST, INST PHYS, H-1521 BUDAPEST, HUNGARY
[3] VIENNA TECH UNIV, INST ALLGEMEINE PHYS, A-1040 VIENNA, AUSTRIA
来源
关键词
D O I
10.1007/BF01226772
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
引用
收藏
页码:786 / 786
页数:1
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