共 50 条
- [4] CAPACITIVE PROBES FOR RF PROCESS PLASMAS [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1989, 60 (11): : 3391 - 3395
- [6] DIFFICULTIES INHERENT TO USE OF ELECTROSTATIC PROBES IN AN RF PLASMA [J]. NUOVO CIMENTO DELLA SOCIETA ITALIANA DI FISICA B-GENERAL PHYSICS RELATIVITY ASTRONOMY AND MATHEMATICAL PHYSICS AND METHODS, 1970, 69 (01): : 115 - &
- [8] Electron heating and control of RF-produced plasma parameters excited by a planar, spiral antenna [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (7B): : 4558 - 4562
- [9] Electrostatic coupling of antenna and the shielding effect in inductive RF plasmas [J]. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1994, 33 (4 B): : 2189 - 2193
- [10] ELECTROSTATIC COUPLING OF ANTENNA AND THE SHIELDING EFFECT IN INDUCTIVE RF PLASMAS [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (4B): : 2189 - 2193