REACTIVE ION ETCHING RESISTANT NEGATIVE RESISTS FOR ION-BEAM LITHOGRAPHY

被引：4
|
作者：
WADA, Y
MOCHIJI, K
OBAYASHI, H
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 01期
关键词：
D O I：
10.1149/1.2119654
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：187 / 190
页数：4
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