MASKING FOR ION-BEAM ETCHING

被引：0

作者：

GLOERSEN, PG ^{[1
]}

机构：

[1] HEWLETT PACKARD CO LABS,PALO ALTO,CA 94302

来源：

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：68 / 73

页数：6

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