ION-BEAM ETCHING FACILITY

被引：0
|
作者：
KOVAL, YI
ILICHEV, EV
机构：
来源：
INSTRUMENTS AND EXPERIMENTAL TECHNIQUES | 1994年 / 37卷 / 03期
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D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A laboratory facility for ion-beam etching is described. The conditions of beam transportation are analyzed. The possibility of producing microstructures with higher aspect ratio is demonstrated. It is shown that the etched sample can be cooled down to liquid-nitrogen temperatures and so the superconducting parameters of HTSC samples can be monitored during the etching process.
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页码：333 / 338
页数：6
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