CHEMISTRY OF POLYMERIC RESISTS USEFUL IN MICROLITHOGRAPHY

被引：7
|
作者：
LEDWITH, A
机构：
来源：
IEE PROCEEDINGS-I COMMUNICATIONS SPEECH AND VISION | 1983年 / 130卷 / 05期
关键词：
D O I：
10.1049/ip-i-1.1983.0043
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
LITHOGRAPHY
引用
收藏
页码：245 / 251
页数：7
相关论文
共 50 条
  • [31] INFLUENCE OF VARIOUS ELECTRO-ATTRACTIVE SUBSTITUENTS ON THE PERFORMANCES OF ACRYLIC TYPE POSITIVE RESISTS IN MICROLITHOGRAPHY
    SERRE, B
    SCHUE, F
    ERANIAN, A
    DATAMANTI, E
    DUBOIS, JC
    MONTGINOUL, C
    GIRAL, L
    PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS, 1983, 393 : 205 - 212
  • [32] Chemically amplified resists: chemistry and processes
    Reichmanis, E.
    Houlihan, F.M.
    Nalamasu, O.
    Neenan, T.X.
    Advanced Materials for Optics and Electronics, 1994, 4 (02): : 83 - 93
  • [33] Radiation chemistry in chemically amplified resists
    Institute of Scientific and Industrial Research, Osaka University, 8-1 Mihogaoka, Ibaraki, Osaka 567-0047, Japan
    Jpn. J. Appl. Phys., 3 PART 1
  • [34] Radiation Chemistry in Chemically Amplified Resists
    Kozawa, Takahiro
    Tagawa, Seiichi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (03)
  • [35] IS CHEMISTRY USEFUL
    BOWEN, DHM
    INDUSTRIAL AND ENGINEERING CHEMISTRY, 1969, 61 (03): : 3 - +
  • [36] Photoresists for microlithography1. Role of organic chemistry in microelectronics
    Debmalya Roy
    P. K. Basu
    S. V. Eswaran
    Resonance, 2002, 7 (7) : 44 - 53
  • [37] CHEMISTRY - IS IT USEFUL
    MOY, MW
    JOURNAL OF CHEMICAL EDUCATION, 1983, 60 (12) : 1038 - 1038
  • [38] MONO-MOLECULAR RESISTS - A NEW APPROACH TO HIGH-RESOLUTION ELECTRON-BEAM MICROLITHOGRAPHY
    BARRAUD, A
    ROSILIO, C
    RUAUDELTEIXIER, A
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 2003 - 2007
  • [39] Organotin bearing polymeric resists for electron beam lithography
    Yogesh, Midathala
    Moinuddin, Mohamad G.
    Khillare, Lalit D.
    Chinthalapalli, Srinivas
    Sharma, Satinder K.
    Ghosh, Subrata
    Gonsalves, Kenneth E.
    MICROELECTRONIC ENGINEERING, 2022, 260
  • [40] Positive resists based on non-polymeric macromolecules
    Sooriyakumaran, R
    Truong, H
    Sundberg, L
    Morris, M
    Hinsberg, B
    Ito, H
    Allen, R
    Huang, WS
    Goldfarb, D
    Burns, S
    Pfeiffer, D
    JOURNAL OF PHOTOPOLYMER SCIENCE AND TECHNOLOGY, 2005, 18 (03) : 425 - 429
12345