PLASMA ANALYSIS BY EXTREME ULTRAVIOLET SPECTROSCOPY

被引:0
|
作者
MARKS, CL
SAYLOR, WP
STERK, AA
机构
关键词
D O I
暂无
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:414 / &
相关论文
共 50 条
  • [31] ANTI-STOKES RADIATION FOR EXTREME ULTRAVIOLET SPECTROSCOPY
    YOUNG, JF
    HARRIS, SE
    ROTHENBERG, JE
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1981, 71 (12) : 1579 - 1579
  • [32] Spatially resolved Fourier transform spectroscopy in the extreme ultraviolet
    Jansen, G. S. M.
    Rudolf, D.
    Freisem, L.
    Eikema, K. S. E.
    Witte, S.
    OPTICA, 2016, 3 (10): : 1122 - 1125
  • [33] EXTREME-ULTRAVIOLET SPECTROSCOPY AND PHOTOMETRY OF EQ PEGASI
    FOSSI, BCM
    LANDINI, M
    FRUSCIONE, A
    DUPUIS, J
    ASTROPHYSICAL JOURNAL, 1995, 449 (01): : 376 - 385
  • [34] Extreme ultraviolet high-harmonic spectroscopy of solids
    T. T. Luu
    M. Garg
    S. Yu. Kruchinin
    A. Moulet
    M. Th. Hassan
    E. Goulielmakis
    Nature, 2015, 521 : 498 - 502
  • [35] Extreme-ultraviolet Ramsey-type spectroscopy
    Pirri, Angela
    Sali, Emiliano
    Corsi, Chiara
    Bellini, Marco
    Cavalieri, Stefano
    Eramo, Roberto
    PHYSICAL REVIEW A, 2008, 78 (04):
  • [36] Extreme ultraviolet high-harmonic spectroscopy of solids
    Luu, T. T.
    Garg, M.
    Kruchinin, S. Yu.
    Moulet, A.
    Hassan, M. Th.
    Goulielmakis, E.
    NATURE, 2015, 521 (7553) : 498 - 502
  • [37] Spectroscopy in the extreme ultraviolet on an electron beam ion trap
    Beiersdorfer, P
    López-Urrutia, JRC
    Springer, P
    Utter, SB
    Wong, KL
    REVIEW OF SCIENTIFIC INSTRUMENTS, 1999, 70 (01): : 276 - 279
  • [38] Laser-Induced Plasma Exposure on Extreme Ultraviolet Lithography Masks: Damage Analysis
    Varghese, Ivin
    Cetinkaya, Cetin
    IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2012, 25 (04) : 630 - 637
  • [39] Effect of Plasma Density on Discharge Produced Plasma Extreme Ultraviolet Source
    Xu Qiang
    Zhao Yong-peng
    Wang Qi
    Yang Yong-tao
    SPECTROSCOPY AND SPECTRAL ANALYSIS, 2017, 37 (08) : 2560 - 2563
  • [40] Plasma diagnostics for investigating extreme ultraviolet light sources
    Yeates, P.
    White, J.
    Kennedy, E. T.
    JOURNAL OF APPLIED PHYSICS, 2010, 108 (09)