LATERAL SELF-DIFFUSION AND ELECTROMIGRATION IN THIN METAL-FILMS

被引：9

|

作者：

TAI, KL

SUN, PH

OHRING, M

机构：

[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974

[2] CHUNG SHAN INST,LUNGTAN,TAIWAN

[3] STEVENS INST TECHNOL,HOBOKEN,NJ 07030

来源：

THIN SOLID FILMS | 1975年 / 25卷 / 02期

关键词：

D O I：

10.1016/0040-6090(75)90054-1

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

收藏

页码：343 / 352

页数：10

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