LATERAL SELF-DIFFUSION AND ELECTROMIGRATION IN THIN METAL-FILMS

被引：9
|
作者：
TAI, KL
SUN, PH
OHRING, M
机构：
[1] BELL TEL LABS INC,MURRAY HILL,NJ 07974
[2] CHUNG SHAN INST,LUNGTAN,TAIWAN
[3] STEVENS INST TECHNOL,HOBOKEN,NJ 07030
来源：
THIN SOLID FILMS | 1975年 / 25卷 / 02期
关键词：
D O I：
10.1016/0040-6090(75)90054-1
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：343 / 352
页数：10
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