INTRINSIC GETTERING IN OXYGEN-FREE SILICON

被引：11
|
作者：
NAUKA, N
LAGOWSKI, J
GATOS, HC
LI, CJ
机构：
来源：
APPLIED PHYSICS LETTERS | 1985年 / 46卷 / 07期
关键词：
D O I：
10.1063/1.95525
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：673 / 675
页数：3
相关论文
共 50 条
  • [41] Oxygen-free copper: Basics and manufacture
    Eklin, Lauri
    Pietilä, Seppo
    Kotipelto, Arto
    Wire Industry, 2002, 69 (824): : 488 - 496
  • [42] THE ROLE OF OXYGEN-FREE RADICALS IN PRECONDITIONING
    AMBROSIO, G
    TRITTO, I
    CHIARIELLO, M
    JOURNAL OF MOLECULAR AND CELLULAR CARDIOLOGY, 1995, 27 (04) : 1035 - 1039
  • [43] THE PRODUCTION AND APPLICATION OF OXYGEN-FREE COPPER
    RAJAINMAKI, H
    HELENIUS, A
    KOLEHMAINEN, M
    JOM-JOURNAL OF THE MINERALS METALS & MATERIALS SOCIETY, 1993, 45 (03): : 68 - 70
  • [44] OXYGEN-FREE RADICALS AND THE INFLAMMATORY RESPONSE
    ARFORS, KE
    DELMAESTRO, RF
    MICROVASCULAR RESEARCH, 1980, 20 (01) : 100 - 100
  • [45] COAL MINING IN AN OXYGEN-FREE ATMOSPHERE
    RICE, JK
    MECHANICAL ENGINEERING, 1971, 93 (03) : 63 - &
  • [46] TRANSVERSE MAGNETORESISTANCE OF OXYGEN-FREE COPPER
    FICKETT, FR
    IEEE TRANSACTIONS ON MAGNETICS, 1988, 24 (02) : 1156 - 1158
  • [47] OXYGEN-FREE RADICALS AND CARDIAC DEPRESSION
    KALRA, J
    PRASAD, K
    CLINICAL BIOCHEMISTRY, 1994, 27 (03) : 163 - 168
  • [48] HIGH-CYCLIC FATIGUE EXPERIMENTS OF SINGLE CRYSTAL SILICON IN AN OXYGEN-FREE ENVIRONMENT
    Yoneoka, Shingo
    Qu, Yu Qiao
    Wang, Shasha
    Messana, Matthew W.
    Graham, Andrew B.
    Salvia, James
    Kim, Bongsang
    Melamud, Renata
    Bahl, Gaurav
    Kenny, Thomas W.
    MEMS 2010: 23RD IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST, 2010, : 224 - 227
  • [49] New intrinsic gettering process in Czochralski-silicon wafer
    Li, YX
    Liu, CC
    Guo, HY
    Wang, X
    Pan, MX
    Xu, YS
    Yang, DR
    Que, DL
    SOLID-STATE AND INTEGRATED-CIRCUIT TECHNOLOGY, VOLS 1 AND 2, PROCEEDINGS, 2001, : 277 - 279
  • [50] FUNDAMENTAL PROPERTIES OF INTRINSIC GETTERING OF IRON IN A SILICON-WAFER
    AOKI, M
    HARA, A
    OHSAWA, A
    JOURNAL OF APPLIED PHYSICS, 1992, 72 (03) : 895 - 898
12345