FORMATION AND PROPERTY OF POLYSILICON OXIDE-FILMS

被引：0

作者：

KIYOSUMI, F ^{[1
]}

INO, M ^{[1
]}

MIZOKAMI, Y ^{[1
]}

机构：

[1] OKI ELECT IND CO LTD,DIV ELECTR DEVICE,HACHIOJI,TOKYO 193,JAPAN

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 03期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C103 / C103

页数：1

共 50 条

[41] THIN SUPERCONDUCTING OXIDE-FILMS
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[J]. PHYSICAL REVIEW B, 1987, 35 (16): : 8821 - 8823
[42] ANODIC OXIDE-FILMS ON TITANIUM
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[J]. ULTRAMICROSCOPY, 1986, 19 (04) : 407 - 407
[43] THIN OXIDE-FILMS ON IRON
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1974, 121 (06) : C191 - C197
[44] ANODIC OXIDE-FILMS ON GAP
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1973, 120 (06) : 844 - 845
[45] SILVER DIFFUSION AND PATTERN-FORMATION ON POLYCRYSTALLINE TIN OXIDE-FILMS
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[J]. JOURNAL OF APPLIED PHYSICS, 1992, 71 (05) : 2238 - 2242
[46] FORMATION OF HYDROUS OXIDE-FILMS ON COBALT UNDER POTENTIAL CYCLING CONDITIONS
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[J]. JOURNAL OF ELECTROANALYTICAL CHEMISTRY, 1982, 132 (JAN): : 247 - 261
[47] FORMATION AND SPALLING OF OXIDE-FILMS ON ZIRCONIUM ALLOYS IN NITRIC-ACID
BARKOV, AA
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[J]. PROTECTION OF METALS, 1989, 25 (05): : 668 - 670
[48] KINETICS OF FORMATION OF ANODIC OXIDE-FILMS ON ALUMINUM IN PRESENCE OF A SURFACTANT, AND THEIR STRUCTURE
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[J]. JOURNAL OF APPLIED CHEMISTRY OF THE USSR, 1988, 61 (08): : 1570 - 1573
[49] PHOTOENHANCED MOCVD OF OXIDE-FILMS
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[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1987, 134 (04) : C231 - C231
[50] XPS STUDY OF THIN OXIDE-FILMS FORMATION ON IRON-ALLOYS
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[J]. SURFACE AND INTERFACE ANALYSIS, 1986, 9 (1-6) : 385 - 385

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