FORMATION AND PROPERTY OF POLYSILICON OXIDE-FILMS

被引：0

|

作者：

KIYOSUMI, F ^{[1
]}

INO, M ^{[1
]}

MIZOKAMI, Y ^{[1
]}

机构：

[1] OKI ELECT IND CO LTD,DIV ELECTR DEVICE,HACHIOJI,TOKYO 193,JAPAN

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1982年 / 129卷 / 03期

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D O I：

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中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

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页码：C103 / C103

页数：1

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