STRUCTURE AND MECHANISM OF FORMATION OF OXIDE-FILMS ON COPPER

被引：0
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作者：
IPATOV, YP
TOMENKO, NY
机构：
来源：
SOVIET ELECTROCHEMISTRY | 1986年 / 22卷 / 04期
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中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
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页码：440 / 444
页数：5
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