CHEMICAL VAPOR-DEPOSITION OF SILICON-NITRIDE

被引：27
|
作者：
GEBHARDT, JJ
TANZILLI, RA
HARRIS, TA
机构：
[1] DIV SPACE,SPACE SCI LAB,PHILADELPHIA,PA 19101
[2] GE,DIV RE ENTRY & ENVIRONM SYST,PHILADELPHIA,PA 19101
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1976年 / 123卷 / 10期
关键词：
D O I：
10.1149/1.2132642
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：1578 / 1582
页数：5
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