POLYSILICON DEVICES AND APPLICATIONS

被引：0
|
作者：
POWELL, MJ
机构：
来源：
IEE PROCEEDINGS-CIRCUITS DEVICES AND SYSTEMS | 1994年 / 141卷 / 01期
关键词：
D O I：
10.1049/ip-cds:19942403
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：2 / 2
页数：1
相关论文
共 50 条
  • [11] Analytical model for polysilicon quantization in MOS devices
    [J]. Dai, Y., 2005, Science Press (26):
  • [12] Fabrication of nanofluidic devices in glass with polysilicon electrodes
    Kutchoukov, VG
    Pakula, L
    Parikesit, GOF
    Garini, Y
    Nanver, LK
    Bossche, A
    [J]. SENSORS AND ACTUATORS A-PHYSICAL, 2005, 123-24 : 602 - 607
  • [13] Development of polysilicon devices for microfluidic thermal instrumentation
    Camps, T.
    Tasselli, J.
    Lubin, J.
    Lagrange, D.
    Bouscayrol, L.
    Marty, A.
    [J]. SENSORS AND ACTUATORS A-PHYSICAL, 2013, 189 : 67 - 73
  • [14] The design of multilayered polysilicon for MOEMS applications
    Sherman, D
    Kahn, H
    Phillips, SM
    Ballarini, R
    Heuer, AH
    [J]. THIN FILMS: STRESSES AND MECHANICAL PROPERTIES IX, 2002, 695 : 377 - 382
  • [15] Applications of bipolar compatible epitaxial polysilicon
    Gennissen, PTJ
    French, PJ
    [J]. MICROMACHINED DEVICES AND COMPONENTS II, 1996, 2882 : 59 - 65
  • [16] Polysilicon thin layers for photovoltaic applications
    Budianu, E
    Purica, M
    Rusu, E
    Manea, E
    Gavrila, R
    [J]. CAS: 2002 INTERNATIONAL SEMICONDUCTOR CONFERENCE, VOLS 1 AND 2, PROCEEDINGS, 2001, : 215 - 218
  • [17] Characteristics of excimer laser annealed polysilicon films for application in polysilicon thin film transistor devices
    Voutsas, T
    Marmorstein, A
    Solanki, R
    [J]. ACTIVE MATRIX LIQUID CRYSTAL DISPLAYS TECHNOLOGY AND APPLICATIONS, 1997, 3014 : 112 - 118
  • [18] Polysilicon integrated microsystems: Technologies and applications
    Howe, RT
    Boser, BE
    Pisano, AP
    [J]. SENSORS AND ACTUATORS A-PHYSICAL, 1996, 56 (1-2) : 167 - 177
  • [19] Trends in polysilicon requirements for FZ applications
    Dawson, HJ
    [J]. PROCEEDINGS OF THE FOURTH INTERNATIONAL SYMPOSIUM ON HIGH PURITY SILICON, 1996, 96 (13): : 27 - 32
  • [20] PLASMA-ETCHING OF POLYSILICON NITRIDE POLYSILICON SANDWICH STRUCTURE FOR SENSOR APPLICATIONS
    LI, YX
    LAROS, M
    SARRO, PM
    FRENCH, PJ
    WOLFFENBUTTEL, RF
    [J]. MICROELECTRONIC ENGINEERING, 1993, 21 (1-4) : 341 - 344
12345