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REACTIVE ION-PLASMA BEAM ETCHING OF SILICON-CARBIDE
被引:0
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作者
:
POPOV, IV
论文数:
0
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0
h-index:
0
POPOV, IV
SYRKIN, AL
论文数:
0
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0
h-index:
0
SYRKIN, AL
CHELNOKOV, VE
论文数:
0
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CHELNOKOV, VE
机构
:
来源
:
PISMA V ZHURNAL TEKHNICHESKOI FIZIKI
|
1986年
/ 12卷
/ 04期
关键词
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D O I
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中图分类号
:
O59 [应用物理学];
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页码:240 / 243
页数:4
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