共 50 条
- [22] ION-BEAM DEPOSITED SILICON-CARBIDE ON GLASS OPTICS AND REPLICA GRATINGS APPLIED OPTICS, 1984, 23 (18): : 3047 - 3049
- [23] Plasma characterization in chlorine-based reactive ion beam etching and chemically assisted ion beam etching 1998, JJAP, Tokyo, Japan (37):
- [24] Plasma characterization in chlorine-based reactive ion beam etching and chemically assisted ion beam etching JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (5A): : 2747 - 2751
- [25] REACTIVE ION ETCHING OF SILICON JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (02): : 410 - 413
- [26] Effects of space exposure on ion-beam-deposited silicon-carbide and boron-carbide coatings Applied Optics, 1998, 37 (34): : 8038 - 8042
- [28] Dry etching of GaN using reactive ion beam etching and chemically assisted reactive ion beam etching GALLIUM NITRIDE AND RELATED MATERIALS II, 1997, 468 : 373 - 377
- [29] ION-IMPLANTATION EFFECTS IN SILICON-CARBIDE NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1993, 80-1 : 889 - 894
- [30] DIFFUSION OF ION IMPLANTATED ALUMINUM IN SILICON-CARBIDE JOURNAL OF CHEMICAL PHYSICS, 1982, 77 (05): : 2592 - 2598