Thin Films in the Presence of Chemical Reactions

被引:0
|
作者
Pereira, A. [1 ]
Trevelyan, P. M. J. [2 ]
Thiele, U. [3 ]
Kalliadasis, S. [1 ]
机构
[1] Imperial Coll London, Dept Chem Engn, London SW7 2AZ, England
[2] Univ Libre Bruxelles, Ctr Nonlinear Phenomena & Complex Syst, B-1050 Brussels, Belgium
[3] Max Planck Inst Phys Komplexer Syst, D-01187 Dresden, Germany
来源
基金
英国工程与自然科学研究理事会;
关键词
Thin films; chemical reactions; thermal/solutalMarangoni effect;
D O I
暂无
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We investigate the interaction between thin films and chemical reactions by using two prototype systems: a thin liquid film falling down a planar inclined substrate in the presence of an exothermic chemical reaction and a horizontal thin liquid film with a reactive mixture of insoluble surfactants on its surface. In the first case the chemical reaction has a stabilizing influence on the dynamics of the film and dampens the free-surface solitary pulses. In the second case the chemical reaction can destabilize the filmand lead to the formation of free-surface solitary pulses.
引用
收藏
页码:303 / 316
页数:14
相关论文
共 50 条
  • [41] Heat and Mass Transfer in the Presence of Heterogeneous Chemical Reactions
    Motulevich, V. P.
    [J]. HEAT TRANSFER RESEARCH, 2005, 36 (05) : 397 - 402
  • [42] Highly nonlinear transport phenomena in presence of chemical reactions
    Sieniutycz, S
    [J]. INZYNIERIA CHEMICZNA I PROCESOWA, 2004, 25 (03): : 2001 - 2009
  • [43] Thermodynamic analysis of fluids with the possible presence of chemical reactions
    Bisio, G
    Cartesegna, M
    Rubatto, G
    [J]. ENERGY CONVERSION AND MANAGEMENT, 2002, 43 (13) : 1619 - 1637
  • [44] STABILITY OF THIN EVAPORATING CONDENSING FILMS IN THE PRESENCE OF SURFACTANTS
    HATZIAVRAMIDIS, D
    [J]. INTERNATIONAL JOURNAL OF MULTIPHASE FLOW, 1992, 18 (04) : 517 - 530
  • [45] Hyperbranched polymers in thin films for chemical sensors
    Voit, Brigitte I.
    Beyerlein, Detlev
    Mikhailova, Yulia
    Hien, Oliver
    Eichhorn, Klaus-Jochen
    Belge, Georg
    Vollprecht, Matthias
    Gauglitz, Guenter
    Serghei, Anatoli
    Kremer, Friedrich
    [J]. ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2006, 231
  • [46] Chemical deposition methods for ferroelectric thin films
    Waser, R
    Schneller, T
    Ehrhart, P
    Hoffmann-Eifert, S
    [J]. FERROELECTRICS, 2001, 259 (1-4) : 205 - 214
  • [47] Chemical bath deposited ZnO thin films
    Sharma, AK
    Patil, PS
    Sharma, TP
    [J]. BULLETIN OF ELECTROCHEMISTRY, 2000, 16 (08): : 367 - 369
  • [48] Chemical vapor deposition of silicon thin films
    Schropp, REI
    [J]. CURRENT OPINION IN SOLID STATE & MATERIALS SCIENCE, 2002, 6 (05): : 423 - 424
  • [49] Chemical solution deposition of perovskite thin films
    Schwartz, RW
    [J]. CHEMISTRY OF MATERIALS, 1997, 9 (11) : 2325 - 2340
  • [50] Micromagnetics of soft magnetic thin films in presence of defects
    Komine, T
    Mitsui, Y
    Shiiki, K
    [J]. JOURNAL OF APPLIED PHYSICS, 1995, 78 (12) : 7220 - 7225