Chemical bath deposited ZnO thin films

被引：0
|
作者：
Sharma, AK [1 ]
Patil, PS
Sharma, TP
机构：
[1] Shivaji Univ, Dept Phys, Kolhapur 416004, Maharashtra, India
[2] Ch Charan Singh Univ, Dept Phys, Meerut 250005, Uttar Pradesh, India
来源：
BULLETIN OF ELECTROCHEMISTRY | 2000年 / 16卷 / 08期
关键词：
zinc oxide thin films; chemical bath deposition; X-ray diffraction;
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
Thin films of ZnO have been prepared by a simple and inexpensive chemical bath deposition technique. The starting solution was prepared from Zinc acetate. Thin films were annealed at 773 K for 2 hours. The resultant films mere of good quality. Structural, electrical and optical properties of the thin films mere carried out.
引用
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页码：367 / 369
页数：3
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