100 MW, 248.4 NM, KRF LASER-EXCITED BY AN ELECTRON-BEAM

被引：60

作者：

TISONE, GC ^{[1
]}

HAYS, AK ^{[1
]}

HOFFMAN, JM ^{[1
]}

机构：

[1] SANDIA LABS,ALBUQUERQUE,NM 87115

来源：

OPTICS COMMUNICATIONS | 1975年 / 15卷 / 02期

关键词：

D O I：

10.1016/0030-4018(75)90281-3

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：188 / 189

页数：2

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