100 MW, 248.4 NM, KRF LASER-EXCITED BY AN ELECTRON-BEAM

被引：60
|
作者：
TISONE, GC [1 ]
HAYS, AK [1 ]
HOFFMAN, JM [1 ]
机构：
[1] SANDIA LABS,ALBUQUERQUE,NM 87115
来源：
OPTICS COMMUNICATIONS | 1975年 / 15卷 / 02期
关键词：
D O I：
10.1016/0030-4018(75)90281-3
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：188 / 189
页数：2
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