100 MW, 248.4 NM, KRF LASER-EXCITED BY AN ELECTRON-BEAM

被引：60

作者：

TISONE, GC ^{[1
]}

HAYS, AK ^{[1
]}

HOFFMAN, JM ^{[1
]}

机构：

[1] SANDIA LABS,ALBUQUERQUE,NM 87115

来源：

OPTICS COMMUNICATIONS | 1975年 / 15卷 / 02期

关键词：

D O I：

10.1016/0030-4018(75)90281-3

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：188 / 189

页数：2

共 50 条

[1] XEF LASER-EXCITED BY AN ELECTRON-BEAM
BYCHKOV, YI
KONOVALOV, IN
TARASENKO, VF
IZVESTIYA VYSSHIKH UCHEBNYKH ZAVEDENII FIZIKA, 1979, (03): : 111 - 113
[2] A STUDY OF THE ELECTRON QUENCHING OF EXCIMERS IN A KRF-STAR LASER-EXCITED BY A COAXIAL ELECTRON-BEAM
PETERS, PJM
BASTIAENS, HMJ
WITTEMAN, WJ
GERBER, T
APPLIED PHYSICS B-PHOTOPHYSICS AND LASER CHEMISTRY, 1987, 43 (04): : 253 - 261
[3] A XECL LASER-EXCITED BY A MICROSECOND ELECTRON-BEAM
BYCHKOV, YI
IVANOV, NG
KONOVALOV, IN
LOSEV, VF
TARASENKO, VF
TELMINOV, EN
KVANTOVAYA ELEKTRONIKA, 1983, 10 (07): : 1510 - 1512
[4] THEORY OF NITROGEN LASER-EXCITED BY A RELATIVISTIC ELECTRON-BEAM
MCARTHUR, DA
POUKEY, JW
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1975, 11 (11) : 892 - 902
[5] CW IODINE ION LASER-EXCITED BY AN ELECTRON-BEAM
MEYER, JD
ROCCA, JJ
YU, Z
COLLINS, GJ
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1982, 18 (03) : 326 - 327
[6] ON THE ELECTRON-BEAM PUMPED KRF LASER
WITTEMAN, WJ
KLEIKAMP, BMHH
JOURNAL OF APPLIED PHYSICS, 1984, 55 (05) : 1299 - 1307
[7] KRF LASER PUMPING BY ELECTRON-BEAM DISCHARGE
BONNET, J
FOURNIER, G
PIGACHE, D
RECHERCHE AEROSPATIALE, 1981, (02): : 67 - 71
[8] BEAM QUALITY OF A KRF LASER PUMPED BY AN ANNULAR ELECTRON-BEAM
KAWAMURA, Y
SUZUKI, K
TOYODA, K
NAMBA, S
OPTICS COMMUNICATIONS, 1982, 43 (02) : 134 - 136
[9] AMPLIFIED SPONTANEOUS EMISSION OF A MOLECULAR NITROGEN LASER-EXCITED BY AN INTENSE RELATIVISTIC ELECTRON-BEAM
LUCHES, A
PERRONE, MR
JOURNAL OF APPLIED PHYSICS, 1975, 46 (11) : 4829 - 4832
[10] ELECTRON-BEAM CONTROLLED DISCHARGE PUMPING OF KRF LASER
MANGANO, JA
JACOB, JH
BULLETIN OF THE AMERICAN PHYSICAL SOCIETY, 1976, 21 (02): : 169 - 169

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