ENHANCED TAIL DIFFUSION OF PHOSPHORUS AND BORON IN SILICON - SELF-INTERSTITIAL PHENOMENA

被引:95
|
作者
MOREHEAD, FF [1 ]
LEVER, RF [1 ]
机构
[1] IBM CORP,GTD DIV,HOPEWELL JUNCTION,NY 12533
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D O I
10.1063/1.96980
中图分类号
O59 [应用物理学];
学科分类号
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页码:151 / 153
页数:3
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