ENHANCED TAIL DIFFUSION OF PHOSPHORUS AND BORON IN SILICON - SELF-INTERSTITIAL PHENOMENA

被引：95
|
作者：
MOREHEAD, FF [1 ]
LEVER, RF [1 ]
机构：
[1] IBM CORP,GTD DIV,HOPEWELL JUNCTION,NY 12533
来源：
APPLIED PHYSICS LETTERS | 1986年 / 48卷 / 02期
关键词：
D O I：
10.1063/1.96980
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：151 / 153
页数：3
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