ENHANCED TAIL DIFFUSION OF PHOSPHORUS AND BORON IN SILICON - SELF-INTERSTITIAL PHENOMENA

被引：95

作者：

MOREHEAD, FF ^{[1
]}

LEVER, RF ^{[1
]}

机构：

[1] IBM CORP,GTD DIV,HOPEWELL JUNCTION,NY 12533

来源：

APPLIED PHYSICS LETTERS | 1986年 / 48卷 / 02期

关键词：

D O I：

10.1063/1.96980

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：151 / 153

页数：3

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