HIGH-CONTRAST STENCIL MASKS FOR HIGH-VOLTAGE ELECTRON-BEAM LITHOGRAPHY

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作者：
VALIEV, KA
VELIKOV, LV
MAKHMUTOV, RK
PROKHOROV, AM
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DOKLADY AKADEMII NAUK SSSR | 1985年 / 284卷 / 03期
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O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
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07 ; 0710 ; 09 ;
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页码：595 / 598
页数：4
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