double gate MOSFET;
2D potential distribution model;
drain current model;
D O I:
10.1088/1674-4926/36/4/044003
中图分类号:
O469 [凝聚态物理学];
学科分类号:
070205 ;
摘要:
A 2D model for the potential distribution in silicon film is derived for a symmetrical double gate MOSFET in weak inversion. This 2D potential distribution model is used to analytically derive an expression for the subthreshold slope and threshold voltage. A drain current model for lightly doped symmetrical DG MOSFETs is then presented by considering weak and strong inversion regions including short channel effects, series source to drain resistance and channel length modulation parameters. These derived models are compared with the simulation results of the SILVACO ( Atlas) tool for different channel lengths and silicon film thicknesses. Lastly, the effect of the fixed oxide charge on the drain current model has been studied through simulation. It is observed that the obtained analytical models of symmetrical double gate MOSFETs are in good agreement with the simulated results for a channel length to silicon film thickness ratio greater than or equal to 2.
机构:
School of Information Science and Engineering,Shenyang University of TechnologySchool of Information Science and Engineering,Shenyang University of Technology
吴美乐
论文数: 引用数:
h-index:
机构:
揣荣岩
论文数: 引用数:
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机构:
JungHee Lee
JongHo Lee
论文数: 0引用数: 0
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机构:
School of EECS Engand ISRC(Inter-University Semiconductor Research Center),Seoul NationalSchool of Information Science and Engineering,Shenyang University of Technology
机构:
School of Information Science and Engineering,Shenyang University of TechnologySchool of Information Science and Engineering,Shenyang University of Technology
吴美乐
论文数: 引用数:
h-index:
机构:
揣荣岩
论文数: 引用数:
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机构:
Jung-Hee Lee
Jong-Ho Lee
论文数: 0引用数: 0
h-index: 0
机构:
School of EECS Eng.and ISRC(Inter-University Semiconductor Research Center),Seoul National UniversitySchool of Information Science and Engineering,Shenyang University of Technology
机构:
Shenyang Univ Technol, Sch Informat Sci & Engn, Shenyang, Liaoning 110870, Peoples R ChinaShenyang Univ Technol, Sch Informat Sci & Engn, Shenyang, Liaoning 110870, Peoples R China
Jin Xiaoshi
Liu Xi
论文数: 0引用数: 0
h-index: 0
机构:
Shenyang Univ Technol, Sch Informat Sci & Engn, Shenyang, Liaoning 110870, Peoples R ChinaShenyang Univ Technol, Sch Informat Sci & Engn, Shenyang, Liaoning 110870, Peoples R China
Liu Xi
Wu Meile
论文数: 0引用数: 0
h-index: 0
机构:
Shenyang Univ Technol, Sch Informat Sci & Engn, Shenyang, Liaoning 110870, Peoples R ChinaShenyang Univ Technol, Sch Informat Sci & Engn, Shenyang, Liaoning 110870, Peoples R China
Wu Meile
Chuai Rongyan
论文数: 0引用数: 0
h-index: 0
机构:
Shenyang Univ Technol, Sch Informat Sci & Engn, Shenyang, Liaoning 110870, Peoples R ChinaShenyang Univ Technol, Sch Informat Sci & Engn, Shenyang, Liaoning 110870, Peoples R China
Chuai Rongyan
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机构:
Jung-Hee Lee
Jong-Ho Lee
论文数: 0引用数: 0
h-index: 0
机构:
Seoul Natl Univ, Inter Univ Semicond Res Center, Sch EECS, Seoul 151742, South KoreaShenyang Univ Technol, Sch Informat Sci & Engn, Shenyang, Liaoning 110870, Peoples R China