INTERFACE STRUCTURE OF GE/SI(111) DURING SOLID-PHASE EPITAXY STUDIED BY MEDIUM-ENERGY ION-SCATTERING

被引:21
|
作者
SUMITOMO, K
NISHIOKA, T
SHIMIZU, N
SHINODA, Y
OGINO, T
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D O I
10.1116/1.579412
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TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
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页码:289 / 294
页数:6
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