INTEGRATED DATA CONVERSION FOR THE ELECTRON-BEAM EXPOSURE SYSTEM EX-7

被引：6

作者：

KOYAMA, K ^{[1
]}

IKENAGA, O ^{[1
]}

ABE, T ^{[1
]}

YOSHIKAWA, R ^{[1
]}

TAKIGAWA, T ^{[1
]}

WATANABE, S ^{[1
]}

机构：

[1] TOSHIBA CORP,CTR SEMICOND SYST ENGN,SAIWAI KU,KAWASAKI 210,JAPAN

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 06期

关键词：

D O I：

10.1116/1.584112

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：2061 / 2065

页数：5

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