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- [2] Coulomb interaction effect correction in electron-beam block exposure lithography JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (12B): : 7217 - 7221
- [3] Coulomb interaction effect correction in electron-beam block exposure lithography Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1999, 38 (12 B): : 7217 - 7221
- [4] ELECTRON-BEAM EXPOSURE SYSTEM JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (06): : 1824 - 1826
- [6] QUADRUPOLE ELECTRON-BEAM EXPOSURE SYSTEM JOURNAL OF ELECTRON MICROSCOPY, 1980, 29 (03): : 318 - 318
- [10] FIELD EMITTER ELECTRON-BEAM EXPOSURE SYSTEM JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1978, 15 (03): : 921 - 921