FIB REPAIR OF CLEAR AND OPAQUE DEFECTS IN X-RAY MASKS

被引：3
|
作者：
PREWETT, PD
GENTILI, M
MAGGIORA, R
MASTROGIACOMO, L
WATSON, JG
TURNER, GS
BROWN, GW
PLUMB, D
LEONARD, Q
CERRINA, F
机构：
[1] Central Microstructure Facility, Rutherford Appleton Laboratory, Chilton, Didcot
[2] CNR/IESS, I-00156 Rome
[3] Center for X-Ray Lithography, University of Wisconsin, Madison
来源：
MICROELECTRONIC ENGINEERING | 1992年 / 17卷 / 1-4期
关键词：
D O I：
10.1016/0167-9317(92)90050-2
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
The repair of a gold on silicon nitride X-ray mask containing simulated defects was carried out using FIB methods. Both opaque and clear defects were repaired by micromachining and tungsten deposition, respectively. PMMA images of the repaired features were produced by X-ray lithography and examined microscopically to determine the properties and effectiveness of the repair process.
引用
收藏
页码：249 / 253
页数：5
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