AN INTRINSIC STRESS SCALING LAW FOR POLYCRYSTALLINE THIN-FILMS PREPARED BY ION-BEAM SPUTTERING

被引：359

|

作者：

WINDISCHMANN, H

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 05期

关键词：

D O I：

10.1063/1.339560

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1800 / 1807

页数：8

相关论文

共 50 条

[1] SUPERCONDUCTING BERYLLIUM THIN-FILMS PREPARED BY ION-BEAM SPUTTERING
TAKEI, K
NAKAMURA, K
MAEDA, Y
JOURNAL OF APPLIED PHYSICS, 1985, 57 (11) : 5093 - 5094
[2] ION-BEAM SPUTTERING OF THIN-FILMS
KANE, SM
AHN, KY
TUXFORD, AM
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1977, 124 (08) : C309 - C309
[3] ION-BEAM SPUTTERING OF ZNS THIN-FILMS
VARITIMOS, TE
TUSTISON, RW
THIN SOLID FILMS, 1987, 151 (01) : 27 - 33
[4] COMPOSITION AND STRESS STATE OF THIN-FILMS DEPOSITED BY ION-BEAM SPUTTERING
CASTELLANO, RN
NOTIS, MR
SIMMONS, GW
VACUUM, 1977, 27 (03) : 109 - 117
[5] DEPOSITION OF OPTICAL THIN-FILMS BY ION-BEAM SPUTTERING
VARASI, M
MISIANO, C
LASAPONARA, L
THIN SOLID FILMS, 1984, 117 (03) : 163 - 172
[6] SUPERCONDUCTING OXIDE THIN-FILMS BY ION-BEAM SPUTTERING
KOBRIN, PH
DENATALE, JF
HOUSLEY, RM
FLINTOFF, JF
HARKER, AB
ADVANCED CERAMIC MATERIALS, 1987, 2 (3B): : 430 - 435
[7] ION-BEAM SPUTTERING DEPOSITION OF FLUOROPOLYMER THIN-FILMS
QUARANTA, F
VALENTINI, A
FAVIA, P
LAMENDOLA, R
DAGOSTINO, R
APPLIED PHYSICS LETTERS, 1993, 63 (01) : 10 - 11
[8] DEPOSITION OF TANTALUM THIN-FILMS BY ION-BEAM SPUTTERING
YAMANAKA, S
NAOE, M
KAWAI, S
JAPANESE JOURNAL OF APPLIED PHYSICS, 1977, 16 (07) : 1245 - 1246
[9] IMPURITIES IN THIN-FILMS PRODUCED BY ION-BEAM SPUTTERING
BHATTACHARYA, RS
JAPANESE JOURNAL OF APPLIED PHYSICS, 1980, 19 (09) : L523 - L526
[10] DEPOSITION AND EVALUATION OF THIN-FILMS BY DC ION-BEAM SPUTTERING
SCHMIDT, PH
SPENCER, EG
CASTELLANO, RN
SOLID STATE TECHNOLOGY, 1972, 15 (07) : 27 - +

← 1 2 3 4 5 →