RAPID THERMAL ANNEALING AND ION-IMPLANTATION OF HETEROEPITAXIAL ZNSE/GAAS

被引：0
|
作者：
SKROMME, BJ
STOFFEL, NG
GOZDZ, AS
TAMARGO, MC
SHIBLI, SM
机构：
来源：
ADVANCES IN MATERIALS, PROCESSING AND DEVICES IN III-V COMPOUND SEMICONDUCTORS | 1989年 / 144卷
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暂无
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
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页码：391 / 396
页数：6
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