DEPOSITION OF OXIDE FILMS BY REACTIVE EVAPORATION

被引：0
|
作者：
RITTER, E
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1965年 / 2卷 / 05期
关键词：
D O I：
暂无
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：280 / &
相关论文
共 50 条
  • [21] Oxygen Gettering Effect During the Reactive Evaporation of Manganese Oxide Films
    Masaaki Isai
    Katsuma Yamaguchi
    Haruhiko Iyoda
    Hiroshi Fujiyasu
    Yasumitsu Ito
    Journal of Materials Research, 1999, 14
  • [22] Oxygen gettering effect during the reactive evaporation of manganese oxide films
    Isai, M
    Yamaguchi, K
    Iyoda, H
    Fujiyasu, H
    Ito, Y
    JOURNAL OF MATERIALS RESEARCH, 1999, 14 (04) : 1653 - 1657
  • [23] PROPERTIES OF INDIUM OXIDE-FILMS PREPARED BY THE REACTIVE EVAPORATION OF INDIUM
    LASER, D
    THIN SOLID FILMS, 1982, 90 (03) : 317 - 321
  • [24] Deposition of indium nitride films by activated reactive evaporation process - a feasibility study
    Patil, SJ
    Bodas, DS
    Mandale, AB
    Gangal, SA
    APPLIED SURFACE SCIENCE, 2005, 245 (1-4) : 73 - 78
  • [25] Reactive pulsed laser deposition of zinc oxide thin films
    Bílková, P
    Mitu, B
    Marotta, V
    Mattei, G
    Orlando, S
    Santagata, A
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2004, 79 (4-6): : 1061 - 1065
  • [26] Deposition of aluminium oxide thin films by reactive magnetron sputtering
    Koski, K
    Hölsä, J
    Juliet, P
    SURFACE & COATINGS TECHNOLOGY, 1999, 116 : 716 - 720
  • [27] Reactive pulsed laser deposition of iridium oxide thin films
    El Khakani, MA
    Chaker, M
    THIN SOLID FILMS, 1998, 335 (1-2) : 6 - 12
  • [28] Reactive pulsed laser deposition of zinc oxide thin films
    P. Bílková
    B. Mitu
    V. Marotta
    G. Mattei
    S. Orlando
    A. Santagata
    Applied Physics A, 2004, 79 : 1061 - 1065
  • [29] FORMATION OF SINGLE CRYSTAL OXIDE FILMS BY REACTIVE AND DIRECT DEPOSITION
    KRIKORIA.E
    VACUUM, 1967, 17 (03) : 171 - &
  • [30] FORMATION OF SINGLE CRYSTAL OXIDE FILMS BY REACTIVE AND DIRECT DEPOSITION
    KRIKORIA.E
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1966, 3 (05): : 315 - &
12345