EFFECTS OF SUBSTRATE-TEMPERATURE ON THE ORIENTATION OF ULTRAHIGH-VACUUM EVAPORATE SI AND GE FILMS

被引：17
|
作者：
CHAO, SS [1 ]
GONZALEZHERNANDEZ, J [1 ]
MARTIN, D [1 ]
TSU, R [1 ]
机构：
[1] INST FIS & QUIM SAO CARLOS,BR-13560 SAO CARLOS,SP,BRAZIL
来源：
APPLIED PHYSICS LETTERS | 1985年 / 46卷 / 11期
关键词：
D O I：
10.1063/1.95771
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1089 / 1091
页数：3
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