EPITAXIAL-GROWTH OF PLATINUM SILICIDE LAYERS ON (111) SI SUBSTRATES

被引：10

作者：

CHEN, JR ^{[1
]}

HEH, TS ^{[1
]}

LIN, MP ^{[1
]}

机构：

[1] NATL TSINGHUA UNIV,DEPT MAT SCI & ENGN,HSINCHU 300,TAIWAN

来源：

SURFACE SCIENCE | 1985年 / 162卷 / 1-3期

关键词：

D O I：

10.1016/0039-6028(85)90963-X

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

引用

页码：657 / 662

页数：6

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