EPITAXIAL-GROWTH OF PLATINUM SILICIDE LAYERS ON (111) SI SUBSTRATES

被引：10
|
作者：
CHEN, JR [1 ]
HEH, TS [1 ]
LIN, MP [1 ]
机构：
[1] NATL TSINGHUA UNIV,DEPT MAT SCI & ENGN,HSINCHU 300,TAIWAN
来源：
SURFACE SCIENCE | 1985年 / 162卷 / 1-3期
关键词：
D O I：
10.1016/0039-6028(85)90963-X
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
引用
收藏
页码：657 / 662
页数：6
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