SURFACE RESISTIVITY AND VIBRATIONAL DAMPING IN ADSORBED LAYERS

被引：51

作者：

PERSSON, BNJ ^{[1
]}

SCHUMACHER, D ^{[1
]}

OTTO, A ^{[1
]}

机构：

[1] UNIV DUSSELDORF,W-4000 DUSSELDORF 1,GERMANY

来源：

CHEMICAL PHYSICS LETTERS | 1991年 / 178卷 / 2-3期

关键词：

D O I：

10.1016/0009-2614(91)87057-I

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

We derive a simple relation between the change in dc resistivity DELTA-rho of a thin metallic film due to adsorption of molecules on the film surface and the electron-hole pair damping (lifetime-tau) of the parallel frustrated translations of the adsorbates. From the measured DELTA-rho for several different adsorbate systems, we deduce the corresponding-tau which ranges from approximately 10(-12)s for chemisorption systems to approximately 10(-9)s for physisorption systems. The result of model calculations for the damping of parallel frustrated translations are presented for three limiting cases of the adsorbate-substrate bond, namely for covalent, ionic, and van der Waals bond.

引用

页码：204 / 212

页数：9

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