SURFACE RESISTIVITY AND VIBRATIONAL DAMPING IN ADSORBED LAYERS

被引：51
|
作者：
PERSSON, BNJ [1 ]
SCHUMACHER, D [1 ]
OTTO, A [1 ]
机构：
[1] UNIV DUSSELDORF,W-4000 DUSSELDORF 1,GERMANY
来源：
CHEMICAL PHYSICS LETTERS | 1991年 / 178卷 / 2-3期
关键词：
D O I：
10.1016/0009-2614(91)87057-I
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
We derive a simple relation between the change in dc resistivity DELTA-rho of a thin metallic film due to adsorption of molecules on the film surface and the electron-hole pair damping (lifetime-tau) of the parallel frustrated translations of the adsorbates. From the measured DELTA-rho for several different adsorbate systems, we deduce the corresponding-tau which ranges from approximately 10(-12)s for chemisorption systems to approximately 10(-9)s for physisorption systems. The result of model calculations for the damping of parallel frustrated translations are presented for three limiting cases of the adsorbate-substrate bond, namely for covalent, ionic, and van der Waals bond.
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页码：204 / 212
页数：9
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