LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF SIOX FILMS

被引：0
|
作者：
ABERNATHEY, J [1 ]
JOHNSON, D [1 ]
NESBIT, L [1 ]
CAMPBELL, D [1 ]
LAM, C [1 ]
机构：
[1] IBM CORP,DIV GEN TECHNOL,ESSEX JUNCTION,VT 05452
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 06期
关键词：
D O I：
暂无
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：C222 / C222
页数：1
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