LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF SIOX FILMS

被引：0

作者：

ABERNATHEY, J ^{[1
]}

JOHNSON, D ^{[1
]}

NESBIT, L ^{[1
]}

CAMPBELL, D ^{[1
]}

LAM, C ^{[1
]}

机构：

[1] IBM CORP,DIV GEN TECHNOL,ESSEX JUNCTION,VT 05452

来源：

JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1985年 / 132卷 / 06期

关键词：

D O I：

暂无

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：C222 / C222

页数：1

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