NOVEL, NEGATIVE-WORKING ELECTRON-BEAM RESIST

被引：0
|
作者：
GEORGIA, SS [1 ]
TAN, ZCH [1 ]
DALY, RC [1 ]
机构：
[1] EASTMAN KODAK CO,RES LABS,ROCHESTER,NY 14650
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1984年 / 188卷 / AUG期
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D O I：
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中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
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页码：12 / ACSC
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